Plasma deposition of thin films utilizing the anodic vacuum arc-Reference-Cited by-同舟云学术

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Plasma deposition of thin films utilizing the anodic vacuum arc

Published:1990 Issue:6 Volume:18 Page:895-903
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Ehrich H.,Hasse B.,Mausbach M.,Muller K.G.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Condensed Matter Physics,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx1/27/2237/00061500.pdf?arnumber=61500

Cited by 35 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Diamond-like films of tetrahedral amorphous carbon deposited by anodic arc evaporation of graphite;Surface and Coatings Technology;2024-02

2. Diamond-Like Films of Tetrahedral Amorphous Carbon Deposited by Anodic Arc Evaporation of Graphite;2023

3. Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications;Coatings;2020-02-27

4. Vacuum Arc Cathode Spots;Encyclopedia of Plasma Technology;2016-12-12

5. Comparison of the wear particle size distribution of different a-C coatings deposited by vacuum arc;Diamond and Related Materials;2014-04

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