Author:
Toshima T.,Nakanishi T.,Yanagisawa K.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
3 articles.
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1. Ion Beam Technology;Handbook of Vacuum Science and Technology;1998
2. Reactive sputter etching of magnetic materials in an HCl plasma;Plasma Chemistry and Plasma Processing;1988-12
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