Rapid Surface Oxidation of the Si Substrate Using Longitudinally Long Ar/O2Loop Type of Inductively Coupled Thermal Plasmas-Reference-Cited by-同舟云学术

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Rapid Surface Oxidation of the Si Substrate Using Longitudinally Long Ar/O2Loop Type of Inductively Coupled Thermal Plasmas

Published:2016-12 Issue:12 Volume:44 Page:3164-3171
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Maruyama Yuji^ORCID,Tanaka Yasunori,Irie Hiromitsu,Tsuchiya Takumi,Tial Mai Kai Suan,Uesugi Yoshihiko,Ishijima Tatsuo,Yukimoto Tetsuya,Kawaura Hiroshi

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Condensed Matter Physics,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx7/27/7762697/07563848.pdf?arnumber=7563848

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent development of new inductively coupled thermal plasmas for materials processing;Advances in Physics: X;2021-01-01

2. Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification;Plasma Chemistry and Plasma Processing;2020-11-28

3. Numerical thermofluid simulation on tandem type of induction thermal plasmas with and without current modulation in a lower coil;Journal of Physics D: Applied Physics;2020-02-18

4. Review of Thermal Plasma Simulation Technique;IEEJ Transactions on Electrical and Electronic Engineering;2019-10-27

5. Effects of the Driving Frequency on Temperature in a Multiphase AC Arc;IEEE Transactions on Plasma Science;2019-01

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