Temperature Influence on the Si(111) Surface Relief Evolution During Au Deposition
Author:
Affiliation:
1. Rzhanov Institute of Semiconductor Physics SB RAS, Novosibirsk State Technical University,Novosibirsk,Russia
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10224902/10225012/10225202.pdf?arnumber=10225202
Reference19 articles.
1. Surface-dependent scenarios for dissolution-driven motion of growing droplets
2. Self-propelled motion of Au–Si droplets on Si(111) mediated by monoatomic step dissolution
3. A lattice Monte Carlo model for nanostructure formation analysis, [Reshetochnaya model’ Monte-Karlo dlya analiza formirovaniya nanostruktur];karpov;Computational approaches and programming [Vychislitel'nye metody i programmirovanie],2014
4. Monte Carlo Simulation of Gold Drop Formation and Movement over a Silicon Substrate
5. Wetting of Si surfaces by Au–Si liquid alloys
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