The Use of Electron-Beam Lithography for Localized Micro-Beam Irradiations-Reference-Cited by-同舟云学术

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The Use of Electron-Beam Lithography for Localized Micro-Beam Irradiations

Published:2011-06 Issue:3 Volume:58 Page:1104-1111
ISSN:0018-9499
Container-title:IEEE Transactions on Nuclear Science
language:
Short-container-title:IEEE Trans. Nucl. Sci.

Author:

Gonzalez-Velo Y.,Boch J.,Pichot F.,Mekki J.,Roche N. J.-H.,Perez S.,Deneau C.,Vaille J.-R.,Dusseau L.,Saigne F.,Lorfevre E.,Schrimpf R. D.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Nuclear Energy and Engineering,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx5/23/5875997/05755135.pdf?arnumber=5755135

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Detectors Array for In Situ Electron Beam Imaging by 16-nm FinFET CMOS Technology;Nanoscale Research Letters;2021-05-25

2. Application of a Focused, Pulsed X-ray Beam for Total Ionizing Dose Testing of Bipolar Linear Integrated Circuits;IEEE Transactions on Nuclear Science;2018-01

3. Introduction;New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices;2014

4. Study of Synergism Effect Between TID and ATREE on the Response of the LM124 Operational Amplifier;IEEE Transactions on Nuclear Science;2011-12

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