Nanometer scale masked ion damage barriers in YBa/sub 2/Cu/sub 3/O/sub 7-δ/

Author:

Kang D.-J.,Speaks R.,Peng N.H.,Webb R.,Jeynes C.,Booij W.E.,Tarte E.J.,Moore D.F.,Blamire M.G.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Transport AC losses of Ag-sheathed Bi-2223 tapes with different twist-pitch using electrical methods;Superconductor Science and Technology;2005-12-06

2. High quality YBa/sub 2/Cu/sub 3/O/sub 7-δ Josephson junctions and junction arrays fabricated by masked proton beam irradiation damage;IEEE Transactions on Appiled Superconductivity;2003-06

3. Masked ion damage and implantation for device fabrication;Vacuum;2002-12

4. Monte Carlo simulations of energetic proton beam irradiation damage defect productions in YBCO thin films with Au masks;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2002-04

5. Irradiation damage technology for manufacturable Josephson junctions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2002-04

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