A Novel Five-Photomask Low-Temperature Polycrystalline Silicon CMOS Structure for AMLCD Application-Reference-Cited by-同舟云学术

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A Novel Five-Photomask Low-Temperature Polycrystalline Silicon CMOS Structure for AMLCD Application

Published:2010-09 Issue:9 Volume:57 Page:2324-2329
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Lee Sang-Jin,Lee Seok-Woo,Oh Kum-Mi,Park Soo-Jeong,Lee Kyung-Eon,Yoo Yong-Su,Lim Kyoung-Moon,Yang Myoung-Su,Yang Yong-Suk,Hwang Yong-Kee

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/5552158/05523967.pdf?arnumber=5523967

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High Temperature Solid Phase Crystallization of a-Si on Glass by Short Time Blue Laser Exposure for Display Backplane;IEEE Electron Device Letters;2022-11

2. Elucidation of electric characteristics for P and N type polycrystalline silicon vertical thin film transistors;Journal of Physics D: Applied Physics;2022-10-27

3. Synergy effect of microwave annealing and high-pressure hydrogen annealing on Poly-Si thin-film transistor;Nanotechnology;2022-08-05

4. High Performance Dual Gate Blue Laser Annealed Poly-Si Thin-Film Transistor for High-Resolution Displays;IEEE Transactions on Electron Devices;2021-08

5. P‐52: A Novel Six‐Mask Low‐Temperature Polycrystalline Silicon Architecture for TFT‐LCD Application;SID Symposium Digest of Technical Papers;2020-08

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