A Two-Dimensional Integrated Process Simulator: SPIRIT-I-Reference-Cited by-同舟云学术

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A Two-Dimensional Integrated Process Simulator: SPIRIT-I

Published:1987-05 Issue:3 Volume:6 Page:439-445
ISSN:0278-0070
Container-title:IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
language:en
Short-container-title:IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst.

Author:

Ohgo M.,Takano Y.,Moniwa A.,Yamamoto S.,Sakai Y.,Masuda H.,Sunami H.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Software

Link

http://xplorestaging.ieee.org/ielx5/43/28441/01270290.pdf?arnumber=1270290

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. CDF Mapper Codef;From Contamination to Defects, Faults and Yield Loss;1996

2. TEPS: Two-dimensional Etching Process Simulator;IETE Journal of Research;1995-05

3. A Very Fast Three-Dimensional Impurity Profile Simulation Incorporating An Accumulated Diffusion Length and Its Application to the Design of Power MOSFETs;Simulation of Semiconductor Devices and Processes;1995

4. Analytical model of the continuum potential for simulation of channeling during implantation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-12

5. Computer-aided design for VLSI circuit manufacturability;Proceedings of the IEEE;1990

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