Stress migration and the mechanical properties of copper

Author:

Alers G.B.,Sukamto J.,Woytowitz P.,Lu X.,Kailasam S.,Reid J.

Publisher

IEEE

Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Analysis of Thermally Grown Oxides on Microperforated Copper Sheets;Journal of Materials Engineering and Performance;2023-05-24

2. Implementation of an OES System to Detect Silane Bursting During HDP SiN Film Deposition;2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2022-05-02

3. Study on Cu Ion Migration Factors and its Mechanism;2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2021-05-10

4. CMOS Reliability from Past to Future: A Survey of Requirements, Trends, and Prediction Methods;IEEE Transactions on Device and Materials Reliability;2021

5. Modeling the copper microstructure and elastic anisotropy and studying its impact on reliability in nanoscale interconnects;Mechanics of Advanced Materials and Modern Processes;2017-03-28

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