300 MM Wafer Laser Anneal Process Development for Applications of Multiple Process Condition in Different Zones on Single Wafer-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

300 MM Wafer Laser Anneal Process Development for Applications of Multiple Process Condition in Different Zones on Single Wafer

Published:2022-06-20 Issue: Volume: Page:
ISSN:
Container-title:2022 China Semiconductor Technology International Conference (CSTIC)
language:
Short-container-title:

Author:

Kang Xiaoxu¹,Huang Yuanhao²,Luo Wen²,Liu Jianrui²,Chu Zhenghui¹,Zhong Xiaolan¹,Zhang Min¹,Zhou Xiaoqiang¹,Zang Kaiyan¹,Li Ming¹,Zhu Limin³,Lu Hanwei³,Zhang Bo³

Affiliation:

1. Shanghai IC R&D Center,Process Technology Department,Shanghai,China,201210

2. Shanghai Micro Electronics Equipment (Group) Co., Ltd.,Shanghai,China,201203

3. Shanghai Huahong Grace Semiconductor Manufacturing Corporation,PIE Department III,Shanghai,China,201206

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9856647/9856709/09856830.pdf?arnumber=9856830

Reference5 articles.

1. Laser Thermal Annealing: A low thermal budget solution for advanced structures and new materials

2. A New Excimer-Laser-Annealing Method for Manufacturing Large OLED Displays

3. Laser annealing of boron‐implanted silicon

4. The TFT a new thin-film transistor[J];weimer;Proceedings of the IRE,0

5. Advanced Fabrication Processes for Superconducting Very Large Scale Integrated Circuits

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP