Defect Reduction with Advanced Lithographic Filter-Reference-Cited by-同舟云学术

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Defect Reduction with Advanced Lithographic Filter

Published:2022-06-20 Issue: Volume: Page:
ISSN:
Container-title:2022 China Semiconductor Technology International Conference (CSTIC)
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Author:

Fang Robb¹,Zhu Alexander¹,Yamada Yoshiaki²

Affiliation:

1. Hangzhou Cobetter Filtration Equipment Co.Ltd.,Hangzhou,China

2. Nippon Cobetter Co.Ltd.,Osaka,Japan

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9856647/9856709/09856845.pdf?arnumber=9856845

Reference4 articles.

1. Defectivity modulation in EUV resists through advanced filtration technologies

2. Defect reduction using POU filtration in a new coater/developer;umeda;Advances in Patterning Materials and Processes XXXIV,0

3. Development of metal purifiers specific to lithography materials

4. Defect reduction by using point-of-use filtration in a new coater/developer

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