Inverse-Designed Ultra-Compact Polarization Splitter–Rotator in Standard Silicon Photonic Platforms With Large Fabrication Tolerance
Author:
Affiliation:
1. Research Institute of Intelligent Networks, Zhejiang Laboratory, Hangzhou, China
2. College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou, China
Funder
Key Research Project of Zhejiang Lab
National Natural Science Foundation of China
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Atomic and Molecular Physics, and Optics
Link
http://xplorestaging.ieee.org/ielx7/50/9937190/09858617.pdf?arnumber=9858617
Reference33 articles.
1. Photonic topology optimization with semiconductor-foundry design-rule constraints
2. Topological design of electromechanical actuators with robustness toward over- and under-etching
3. Analytical level set fabrication constraints for inverse design
4. Minimum length scale in topology optimization by geometric constraints
5. Compact highly-efficient polarization splitter and rotator based on 90° bends
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