The fabrication of thin-film bulk acoustic wave resonators employing a ZnO/Si composite diaphragm structure using porous silicon layer etching-Reference-Cited by-同舟云学术

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The fabrication of thin-film bulk acoustic wave resonators employing a ZnO/Si composite diaphragm structure using porous silicon layer etching

Published:1999-03 Issue:3 Volume:20 Page:113-115
ISSN:0741-3106
Container-title:IEEE Electron Device Letters
language:
Short-container-title:IEEE Electron Device Lett.

Author:

Sang-Ho Kim ,Jae-Sung Lee ,Hyun-Chul Choi ,Yong-Hyun Lee

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx4/55/16159/00748905.pdf?arnumber=748905

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