Refractive Index Modification in Thin Film Barium Titanate-on-Insulator and Dry Etch Free Fabrication of Waveguide Devices-Reference-Cited by-同舟云学术

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Refractive Index Modification in Thin Film Barium Titanate-on-Insulator and Dry Etch Free Fabrication of Waveguide Devices

Published:2023-11-12 Issue: Volume: Page:
ISSN:
Container-title:2023 IEEE Photonics Conference (IPC)
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Author:

Cao Yu¹,Lin Hong-Lin¹,Liang Haidong²,Bettiol Andrew²,Dogheche Elhadj³,Danner Aaron¹

Affiliation:

1. National University of Singapore,Department of Electrical and Computer Engineering,Singapore,117583

2. National University of Singapore,Centre for Ion Beam Applications (CIBA),Department of Physics,Singapore,117542

3. Université Polytechnique Hauts de France,Institut d'Electronique, de Microélectronique et de Nanotechnologie - Site de Valenciennes, IEMN CNRS UMR 8520,Valenciennes,France,59309

Funder

National Research Foundation

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10360489/10360472/10360613.pdf?arnumber=10360613

Reference8 articles.

1. The Electrooptic and Photorefractive Effects

2. Status and Potential of Lithium Niobate on Insulator (LNOI) for Photonic Integrated Circuits

3. Ultra-low loss ridge waveguides on lithium niobate via argon ion milling and gas clustered ion beam smoothening

4. Integrated lithium niobate electro-optic modulators operating at CMOS-compatible voltages

5. A Barium Titanate‐on‐Oxide Insulator Optoelectronics Platform

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