RF sputter-deposited aluminum-oxide films as high quality artificial tunnel barriers
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx5/20/22886/01064989.pdf?arnumber=1064989
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Sub-micrometer epitaxial Josephson junctions for quantum circuits;Superconductor Science and Technology;2011-12-22
2. Fabrication of niobium superconductor–insulator–superconductor junctions with a magnetic tunneling barrier NiOx for millimeter and submillimeter mixer applications;Journal of Applied Physics;2002-09
3. Direct current magnetron sputtered In2O3films as tunnel barriers;Journal of Applied Physics;1994-03
4. Artificial Tunnel Barriers;Superconducting Devices;1990
5. SQUID magnetometers for low-frequency applications;Journal of Low Temperature Physics;1989-09
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