Evaluation of plasma deposited silicon nitride thin films for microsystems technology-Reference-Cited by-同舟云学术

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Evaluation of plasma deposited silicon nitride thin films for microsystems technology

Published:2005-10 Issue:5 Volume:14 Page:971-977
ISSN:1057-7157
Container-title:Journal of Microelectromechanical Systems
language:
Short-container-title:J. Microelectromech. Syst.

Author:

Soh M.T.K.,Musca C.A.,Savvides N.,Dell J.M.,Faraone L.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

http://xplorestaging.ieee.org/ielx5/84/32479/01516179.pdf?arnumber=1516179

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface Micromachining;Introduction to Microfabrication;2010-11-09

2. NITRIDATION OF SILICON WITH AMMONIA AND NITROGEN;International Journal of Nanoscience;2010-06

3. Materials and Processes for MEMS-Based Infrared Microspectrometer Integrated on HgCdTe Detector;IEEE Journal of Selected Topics in Quantum Electronics;2008

4. On the bonding microstructure of amorphous silicon oxide thin films;Thin Solid Films;2006-12

5. Nanoindentation of plasma-deposited nitrogen-rich silicon nitride thin films;Journal of Applied Physics;2006-07-15

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