Non-volatile FCG (ferroelectric-capacitor and transistor-gate connection) memory cell with non-destructive read-out operation
Author:
Publisher
Widerkehr & Associates
Link
http://xplorestaging.ieee.org/ielx5/3767/11001/00507792.pdf?arnumber=507792
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. BEOL-Compatible Multiple Metal-Ferroelectric-Metal (m-MFM) FETs Designed for Low Voltage (2.5 V), High Density, and Excellent Reliability;2020 IEEE International Electron Devices Meeting (IEDM);2020-12-12
2. Ferroelectric FETs-Based Nonvolatile Logic-in-Memory Circuits;IEEE Transactions on Very Large Scale Integration (VLSI) Systems;2019-01
3. Experimental observation of voltage amplification using negative capacitance for sub-60 mV/decade CMOS devices;Current Applied Physics;2015-03
4. A Ferroelectric Associative Memory Technology Employing Heterogate FGMOS Structure;IEEE Transactions on Electron Devices;2005-10
5. Fabrication and Characterization of 1T2C-Type Ferroelectric Memory Cell with Local Interconnections;Japanese Journal of Applied Physics;2002-11-30
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