Development of X-Shaped Filtered-Arc-Deposition (X-FAD) Apparatus and DLC/Cr Film Preparation-Reference-Cited by-同舟云学术

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Development of X-Shaped Filtered-Arc-Deposition (X-FAD) Apparatus and DLC/Cr Film Preparation

Published:2007-08 Issue:4 Volume:35 Page:1014-1019
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Tanoue Hideto,Hikosaka Hiroki,Iwasaki Yasuhiro,Takikawa Hirofumi,Sakakibara Tateki,Hasegawa Yushi

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Condensed Matter Physics,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx5/27/4287020/04287091.pdf?arnumber=4287091

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. DC vacuum arc deposition with open winding-path anode assembled with C-ring plates;Japanese Journal of Applied Physics;2023-03-01

2. 60 years of DLC coatings: Historical highlights and technical review of cathodic arc processes to synthesize various DLC types, and their evolution for industrial applications;Surface and Coatings Technology;2014-10

3. T-shape filtered arc deposition system with built-in electrostatic macro-particle trap for DLC film preparation;Thin Solid Films;2009-12

4. Development of Y-Shaped Filtered-Arc-Deposition System for Preparing Multielement Composition-Controlled Film;IEEE Transactions on Plasma Science;2009-07

5. Kinetics and characterization of hydrogenated carbon with ruthenium interlayer;Thin Solid Films;2009-07

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