Improving Performance of FBARs by Advanced Low-Temperature High-Pressure Technology-Reference-Cited by-同舟云学术

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Improving Performance of FBARs by Advanced Low-Temperature High-Pressure Technology

Published:2023-03-27 Issue: Volume: Page:
ISSN:
Container-title:2023 35th International Conference on Microelectronic Test Structure (ICMTS)
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Author:

Tu Yu-Fa¹,Chang Ting-Chang²,Zhou Kuan-Ju²,Hung Wei-Chun²,Kuo Ting-Tzu³,Lien Chen-Hsin¹

Affiliation:

1. Institute of Electronics Engineering, National Tsing Hua University,Hsinchu,Taiwan,30013

2. National Sun Yat-sen University,Department of Physics,Kaohsiung,Taiwan,80424

3. National Sun Yat-sen University,Department of Electrical Engineering,Kaohsiung,Taiwan,80424

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/10094038/10094053/10094148.pdf?arnumber=10094148

Reference9 articles.

1. Materials, Design, and Characteristics of Bulk Acoustic Wave Resonator: A Review

2. Thin film bulk wave acoustic resonators (FBAR) for wireless applications

3. Resist Pattern Collapse Modeling for Smaller Features;lee;J Korean Phys Soc,2003

4. Silicon microstructuring technology

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