High-Q On-Chip Capacitors Featuring “Self-Inductance Cancellation” for RF and mm-Wave Applications
Author:
Affiliation:
1. Intel Corporation, Hillsboro, OR, USA
2. Intel Corporation, Santa Clara, CA, USA
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Link
http://xplorestaging.ieee.org/ielx7/7260/9789421/09765590.pdf?arnumber=9765590
Reference14 articles.
1. Cu/Co Multilayer-Based High Signal Integrity and Low RF Loss Conductors for 5G/Millimeter Wave Applications
2. 22FFL: A high performance and ultra low power FinFET technology for mobile and RF applications
3. Intel 22 nm low-power FinFET (22FFL) process technology for 5G and beyond;lee;Proc IEEE Custom Integr Circuits Conf (CICC),2020
4. mmWave and sub-THz technology development in Intel 22 nm FinFET (22FFL) process;yu;IEDM Tech Dig,2020
5. A simple through-only de-embedding method for on-wafer S-parameter measurements up to 110 GHz;ito;IEEE MTT-S Int Microw Symp Dig,2008
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