Author:
Chen Tai-Chen,Liao Guang-Wan,Chang Yao-Wen
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Computer Graphics and Computer-Aided Design,Software
Cited by
4 articles.
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1. A study on flare minimisation in EUV lithography by post‐layout re‐allocation of wire segments;IET Circuits, Devices & Systems;2021-03-29
2. Fast Lithographic Mask Optimization Considering Process Variation;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2016-08
3. Simultaneous EUV Flare Variation Minimization and CMP Control by Coupling-Aware Dummification;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2016-04
4. Design for Manufacturing With Emerging Nanolithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2013-10