Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
9 articles.
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1. Inverse Lithography with Adaptive Mask Complexity;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17
2. Mask optimization method based on residual network;2nd International Conference on Laser, Optics and Optoelectronic Technology (LOPET 2022);2022-10-14
3. 深紫外计算光刻技术研究;Laser & Optoelectronics Progress;2022
4. Crystal Growth and Defect Characterization of AlN Single Crystals;MRS Proceedings;2005-01
5. Analysis of the impact of proximity correction algorithms on circuit performance;IEEE Transactions on Semiconductor Manufacturing;1999