Impact of CnRx Structure on Soft Error Rates of Flip-Flop Designs at 22-nm FD SOI Node
Author:
Affiliation:
1. Department of Electrical and Computer Engineering, University of Saskatchewan, Saskatoon, Canada
2. Cisco Systems, San Jose, CA, USA
3. Department of Electrical and Computer Engineering, Vanderbilt University, Nashville, TN, USA
Funder
Natural Sciences and Engineering Research Council of Canada
Cisco Systems
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Nuclear Energy and Engineering,Nuclear and High Energy Physics
Link
http://xplorestaging.ieee.org/ielx7/23/10221199/10090239.pdf?arnumber=10090239
Reference16 articles.
1. Single-event effects in advanced CMOS technologies — Analysis and mitigation
2. Utilizing device stacking for area efficient hardened SOI flip-flop designs
3. Revisited parasitic bipolar effect in FDSOI MOSFETs: mechanism, gain extraction and circuit applications
4. Impact of strained-Si PMOS transistors on SRAM soft error rates
5. Continuous RX standard cell placement support in ICC for GLOBALFOUNDRIES 20 nm & below technologies;prakash;Proc SNUG,2014
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1. SEU Performance of RHBD Flip-Flops Using Guard Gates at 22-nm FDSOI Technology Node;IEEE Transactions on Nuclear Science;2023-08
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