Elevated field insulator (ELFIN) process for device isolation of ultrathin SOI MOSFETs with top silicon film less than 20 nm
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Published:2002-08
Issue:8
Volume:23
Page:467-469
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ISSN:0741-3106
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Container-title:IEEE Electron Device Letters
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language:
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Short-container-title:IEEE Electron Device Lett.
Author:
Jong-Wook Lee ,Saitoh Y.,Koh R.,Mogami T.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials