Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Computer Graphics and Computer-Aided Design,Software
Cited by
17 articles.
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1. Past progress, current status, and future perspective of digital EUV lithography for high-resolution semiconductor manufacturing;Novel Patterning Technologies 2024;2024-04-09
2. CompressKey—Near Lossless Layout Compression and Encryption Using Convolutional Auto-Encoder Model and Expansion-Reduction Pattern Techniques;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-04
3. Cost-effective and channel-scalable hardware decoders for multiple electron-beam direct-write systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-22
4. Impact of parallelism on data volumes for a multibeam mask writer;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
5. Lossless layout image compression algorithms for electron-beam direct-write lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-11