Novel MWL μDBO pi-run Flow at Day 1 of RD Phase

Author:

Zhu Yifei,Qian Rui,Liu Biqiu,Guo Xiaobo,Zhang Cong,Huang Jun,Zhang Yu,Zhou Wenzhan

Publisher

IEEE

Reference4 articles.

1. Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET);chen;Proc SPIE,2014

2. Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography

3. Accuracy of Diffraction-Based and Image-Based Overlay;ke;Proc SPIE,2011

4. A study of swing-curve physics in diffraction-based overlay;bhattacharyya;Proc of SPIE,2016

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