The device architecture dilemma for CMOS technologies: Opportunities & challenges of finFET over planar MOSFET-Reference-Cited by-同舟云学术

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The device architecture dilemma for CMOS technologies: Opportunities & challenges of finFET over planar MOSFET

Published:2009-04 Issue: Volume: Page:
ISSN:
Container-title:2009 International Symposium on VLSI Technology, Systems, and Applications
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Author:

Parvais B.,Mercha A.,Collaert N.,Rooyackers R.,Ferain I.,Jurczak M.,Subramanian V.,De Keersgieter A.,Chiarella T.,Kerner C.,Witters L.,Biesemans S.,Hoffman T.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/5129138/5159260/05159300.pdf?arnumber=5159300

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fin core dimensionality and corner effect in dual core gate-all-around FinFET;Microelectronics Journal;2024-01

2. Molecular layer deposition of hybrid silphenylene-based dielectric film;Advanced Composites and Hybrid Materials;2023-10

3. Optimizing U-Shape FinFETs for Sub-5nm Technology: Performance Analysis and Device-to-Circuit Evaluation in Digital and Analog/Radio Frequency Applications;ECS Journal of Solid State Science and Technology;2023-09-01

4. Design Technology Co-Optimization Strategy for Ge Fraction in SiGe Channel of SGOI FinFET;Nanomaterials;2023-05-23

5. Performance Optimization and Analysis of a Work function engineered 20nm Grooved channel Junctionless FinFET for Hydrogen Sensing;2022 IEEE International Conference on Emerging Electronics (ICEE);2022-12-11

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