Difference Image-Based Training Sets for Automatic Defect Classification at Outgoing Inspection
Author:
Affiliation:
1. Characterization CFM GLOBALFOUNDRIES,Malta,New York
2. Lithography GLOBALFOUNDRIES,Malta,New York
3. Data & Analytics GLOBALFOUNDRIES,Malta,New York
4. Data & Analytics GLOBALFOUNDRIES,Woodlands,Singapore
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx8/10545359/10545360/10545494.pdf?arnumber=10545494
Reference17 articles.
1. A voting-based ensemble feature network for semiconductor wafer defect classification;Misra;Scientific Reports,2022
2. A Review on Machine and Deep Learning for Semiconductor Defect Classification in Scanning Electron Microscope Images
3. Automated Semiconductor Defect Inspection in Scanning Electron Microscope Images: a Systematic Review;Lechien,2023
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