AI-Powered Process Optimization for EUV MOR: Equipment Trace Data Feature Extraction and Machine Learning is Essential for CD Control-Reference-Cited by-同舟云学术

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AI-Powered Process Optimization for EUV MOR: Equipment Trace Data Feature Extraction and Machine Learning is Essential for CD Control

Published:2024-05-13 Issue: Volume: Page:1-5
ISSN:
Container-title:2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
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Author:

Finlay Boyd¹,Faria Mario¹,Gueci Steven²,Holzer Eric¹,Latham Nicholas³,Ortega Francis¹

Affiliation:

1. Tignis Inc,Seattle,WA

2. America, LLC,TEL Technology Center,Albany,NY

3. IBM Research,Albany,NY

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx8/10545359/10545360/10545368.pdf?arnumber=10545368

Reference5 articles.

1. Photoresists in extreme ultraviolet lithography (EUVL)

2. A survey on data compression techniques: From the perspective of data quality, coding schemes, data type and applications

3. Equipment Reliability Optimization Using Predictive Reliability Centered Maintenance

4. Requirements for first-time-right response in advanced manufacturing

5. Device scaling vs. process control scaling: Advanced sensorization closes the gap;Finlay;ISSM 2017

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