Optimization of Si/sub 1-x/Ge/sub x//Si waveguide photodetectors operating at λ=1.3 μm-Reference-Cited by-同舟云学术

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Optimization of Si/sub 1-x/Ge/sub x//Si waveguide photodetectors operating at λ=1.3 μm

Published:1996-05 Issue:5 Volume:14 Page:787-797
ISSN:0733-8724
Container-title:Journal of Lightwave Technology
language:
Short-container-title:J. Lightwave Technol.

Author:

Naval L.,Jalali B.,Gomelsky L.,Liu J.M.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Atomic and Molecular Physics, and Optics

Link

http://xplorestaging.ieee.org/ielx1/50/10805/00495159.pdf?arnumber=495159

Cited by 48 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design of Si(1–x–y) Sn(x) C(y)/Si Hetrostructure EOM for Optical Signal Processing Applications;Lecture Notes in Electrical Engineering;2022

2. Mode, dispersion, and loss analysis of a graded-index germanium-doped silicon buried strip waveguide;Optical Engineering;2020-01-25

3. Design and Analysis of a Graded-Index Strained Si $_{1-x}$ Ge $_x$ Optical PN Phase Shifter;IEEE Photonics Journal;2018-12

4. Invited Article: Optical dynamic range compression;APL Photonics;2018-11

5. Mode and Loss Analysis of a Graded Si1−xGex StripWaveguide;Asia Communications and Photonics Conference;2017

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