A Fast and Accurate Middle End of Line Parasitic Capacitance Extraction for MOSFET and FinFET Technologies Using Machine Learning
Author:
Affiliation:
1. Siemens EDA American University in Cairo,Cairo,Egypt
2. Siemens EDA,Cairo,Egypt
3. American University in Cairo,Cairo,Egypt
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9712466/9712479/09712514.pdf?arnumber=9712514
Reference15 articles.
1. A Novel Customized RC Tightened Corner Modeling Methodology Using Statistical SPICE Simulation in Advanced FinFET Technology
2. Connectivity-Based Machine Learning Compact Models for Interconnect Parasitic Capacitances
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1. Testing Significance of Layout Dependent Impacts on Silicon Chips Performance;2023 3rd International Conference on Intelligent Technologies (CONIT);2023-06-23
2. Machine Learning Approaches for Electronic Design Automation in IC Design Flow;2022 Sixth International Conference on I-SMAC (IoT in Social, Mobile, Analytics and Cloud) (I-SMAC);2022-11-10
3. CNN-Cap: Effective Convolutional Neural Network Based Capacitance Models for Interconnect Capacitance Extraction;ACM Transactions on Design Automation of Electronic Systems;2022-09-26
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