A Method for Measuring Interface Roughness from Cross-Sectional Micrographs-Reference-Cited by-同舟云学术

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A Method for Measuring Interface Roughness from Cross-Sectional Micrographs

Published:2023-08 Issue:5 Volume:33 Page:1-5
ISSN:1051-8223
Container-title:IEEE Transactions on Applied Superconductivity
language:
Short-container-title:IEEE Trans. Appl. Supercond.

Author:

Balachandran Shreyas¹^ORCID,Smathers David B.²^ORCID,Kim Jiman³,Sim Kihong³,Lee Peter J.⁴^ORCID

Affiliation:

1. Applied Superconductivity Center, National High Magnetic Field Laboratory, Tallahassee, FL, USA

2. Materion, Mayfield Heights, OH, USA

3. Kiswire Advanced Technology, Company Ltd, Daejeon, South Korea

4. Applied Superconductivity Center, National High Magnetic Laboratory, Tallahassee, FL, USA

Funder

State of Florida, Florida State University

NSF Cooperative

State of Florida at the NHMFL

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://ieeexplore.ieee.org/ielam/77/10018135/10059172-aam.pdf

Reference19 articles.

1. Fiji: an open-source platform for biological-image analysis

2. Quantification of the interfacial roughness when coating stainless steel onto aluminium by friction surfacing

3. On the nature of surface roughness with application to contact mechanics, sealing, rubber friction and adhesion

4. Gwyddion: an open-source software for SPM data analysis

5. Quantitative assessment of the interfacial roughness in multi-layered materials using image analysis: Application to oxidation in ceramic-based materials

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