A Method for Measuring Interface Roughness from Cross-Sectional Micrographs

Author:

Balachandran Shreyas1ORCID,Smathers David B.2ORCID,Kim Jiman3,Sim Kihong3,Lee Peter J.4ORCID

Affiliation:

1. Applied Superconductivity Center, National High Magnetic Field Laboratory, Tallahassee, FL, USA

2. Materion, Mayfield Heights, OH, USA

3. Kiswire Advanced Technology, Company Ltd, Daejeon, South Korea

4. Applied Superconductivity Center, National High Magnetic Laboratory, Tallahassee, FL, USA

Funder

State of Florida, Florida State University

NSF Cooperative

State of Florida at the NHMFL

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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