Author:
Tung C. J.,Ashley J. C.,Ritchie R. H.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Nuclear Energy and Engineering,Nuclear and High Energy Physics
Cited by
27 articles.
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1. Stochastic exposure kinetics of extreme ultraviolet photoresists: Trapping model;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11
2. Secondary Electrons in EUV Lithography;Journal of Photopolymer Science and Technology;2013
3. Resist pattern prediction at EUV;SPIE Proceedings;2010-03-11
4. A review of the 40-year history of the NSREC'S dosimetry and facilities session (1963-2003);IEEE Transactions on Nuclear Science;2003-06
5. Secondary electrons produced by soft x rays;Radiation Sources and Radiation Interactions;1999-09-15