Ultrafast and Accurate Proximity Effect Correction of Large-Scale Electron Beam Lithography based on FMM and SaaS-Reference-Cited by-同舟云学术

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Ultrafast and Accurate Proximity Effect Correction of Large-Scale Electron Beam Lithography based on FMM and SaaS

Published:2020-11-05 Issue: Volume: Page:
ISSN:
Container-title:2020 International Workshop on Advanced Patterning Solutions (IWAPS)
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Author:

Hou Chengyang,Yao Wenze,Liu Wei,Chen Yiqin,Duan Huigao,Liu Jie

Funder

National Natural Science Foundation of China

Fundamental Research Funds for the Central Universities of China

Key Research and Development Project of Hunan Province, China

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9286788/9286789/09286816.pdf?arnumber=9286816

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Efficient Proximity Effect Correction Using Fast Multipole Method With Unequally Spaced Grid for Electron Beam Lithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-01

2. Accurate and Efficient Proximity Effect Correction for Electron Beam Lithography Based on Multilayer Perceptron Neural Network;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

3. Accurate and Efficient Proximity Effect Correction for Electron Beam Lithography Based on Distributed Parallel Computing;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

4. HNU-EBL: A Software Toolkit for Electron Beam Lithography Simulation and Optimization;2021 International Workshop on Advanced Patterning Solutions (IWAPS);2021-12-12

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