An effective method of contour extraction for SEM image based on DCNN-Reference-Cited by-同舟云学术

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An effective method of contour extraction for SEM image based on DCNN

Published:2020-11-05 Issue: Volume: Page:
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Container-title:2020 International Workshop on Advanced Patterning Solutions (IWAPS)
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Author:

Zhou Tao,Shi Xuelong,YanYan ,Li Chen,Chen Shoumian,Zhao Yuhang,Zhou Wenzhan,Zhou Kan,Zeng Xuan

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9286788/9286789/09286798.pdf?arnumber=9286798

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. An Innovative Lithography Process Window Decision Based On Aggregation of Multi Machine Learning Approaches;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26

3. Application in lithography inspection of phase basic image registration algorithm;2023 International Workshop on Advanced Patterning Solutions (IWAPS);2023-10-26

4. Broad learning solution for rapid diagnosis of COVID-19;Biomedical Signal Processing and Control;2023-05

5. The classification of wheat species based on deep convolutional neural networks using scanning electron microscope (SEM) imaging;European Food Research and Technology;2022-12-31

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