Sensitivity Enhancement of Dielectric Plasma Etching Endpoint Detection by Optical Emission Spectra With Modified $K$ -Means Cluster Analysis-Reference-Cited by-同舟云学术

Sensitivity Enhancement of Dielectric Plasma Etching Endpoint Detection by Optical Emission Spectra With Modified $K$ -Means Cluster Analysis

Published:2017-02 Issue:1 Volume:30 Page:17-22
ISSN:0894-6507
Container-title:IEEE Transactions on Semiconductor Manufacturing
language:
Short-container-title:IEEE Trans. Semicond. Manufact.

Author:

Jang Haegyu^ORCID,Lee Hakseung^ORCID,Lee Honyoung^ORCID,Kim Chang-Koo^ORCID,Chae Heeyeop^ORCID

Funder

Industrial Technology Innovation Program (Development of Dry Cleaning Technology for Nanoscale Patterns) through the Ministry of Trade, Industry and Energy (South Korea)

National Research Foundation of Korea funded by the Korean Government

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/66/7831499/07817899.pdf?arnumber=7817899

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