Dependence of segregated microstructure in sputter-deposited CoCr film on deposition conditions
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx5/20/22889/01065612.pdf?arnumber=1065612
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Magnetic and Microstructure of Triple C/Co 73 Cr 22 Ta 5 /Ti for Perpendicular Media;Chinese Physics Letters;2007-06
2. Microscopic magnetization reversal in perpendicular anisotropy CoCr thin films;Applied Physics Letters;2000-01-31
3. Stress and stress anisotropy in Co-Cr magnetic thin films deposited by magnetron sputtering;Thin Solid Films;1996-01
4. Crystallographic and structural analyses of perpendicular magnetic Co‐Pt‐B‐O alloy films;Journal of Applied Physics;1993-05-15
5. Perpendicular magnetic anisotropy and rotational hysteresis loss in Co-Cr films;Journal of Magnetism and Magnetic Materials;1993-02
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