Low-pressure chemical-vapor-deposited silicon-rich oxides for nonvolatile memory applications
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx1/55/4976/00192865.pdf?arnumber=192865
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1. Nanocrystals manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-02
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3. Insulating Ultrathin Silica Films Formed by a Room‐Temperature Sol–Gel Process;Advanced Materials;2001-05
4. Off-stochiometric silicon oxides for applications in low-voltage flash memories;Microelectronic Engineering;1999-09
5. Observation of Poole–Frenkel effect saturation in SiO2 and other insulating films;Thin Solid Films;1999-09
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