Preparation of highly stable TbFeCo thin films by plasma-free sputtering at high rate
Author:
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx1/20/1843/00050528.pdf?arnumber=50528
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of process parameters on glow discharge and film thickness uniformity in facing target sputtering;Thin Solid Films;1997-01
2. Twin facing target sputtering system for the deposition of multilayer and alloy films;Vacuum;1997-01
3. Investigation of magnetization reversal mechanism in nanometer-thick Tb-Fe-Co films with Al overlayer;IEEE Transactions on Magnetics;1996
4. Improvement of magneto‐optical characteristics of TbFeCo/Al bilayered films at a short wavelength of 400 nm;Journal of Applied Physics;1991-11-15
5. Microstructure and thermal stability of TbFeCo thin films prepared by plasma-free sputtering;Materials Science and Engineering: A;1991-03
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