Sputtering Deposition With Low Cost Multi-Element Powder Targets
Author:
Affiliation:
1. Electrical and Electronic Engineering Program, School of Engineering and Graduate School of Engineering, Nagasaki University, Nagasaki City, Japan
Funder
JSPS KAKENHI
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Materials Chemistry,Electrical and Electronic Engineering,Computer Science Applications,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/8782713/10007543/10298617.pdf?arnumber=10298617
Reference49 articles.
1. Investigation of physico-chemical properties of conductive Ga-doped ZnO thin films deposited on glass and silicon wafers by RF magnetron sputtering
2. A novel technique for the deposition of aluminium-doped zinc oxide films
3. Characteristics of the structure and properties of ZnSnO3 films by varying the magnetron sputtering parameters;wu;Acta Metallurgica Sinica,2016
4. Thermal Annealing Effects on the Characteristics of Transparent Semiconducting Zn2SnO4Thin Films Prepared by RF-Magnetron Sputtering with Powder Target
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