Author:
Zhou Ming,Deng Hao,Chao Zhang Bei
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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1. Atomic layer deposition of amorphous Ni-Ta-N films for Cu diffusion barrier;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2018-05