Liquid Phase Deposition of Hafnium Oxide Thin Films-Reference-Cited by-同舟云学术

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Liquid Phase Deposition of Hafnium Oxide Thin Films

Published:2024-08 Issue:4 Volume:31 Page:1659-1665
ISSN:1070-9878
Container-title:IEEE Transactions on Dielectrics and Electrical Insulation
language:
Short-container-title:IEEE Trans. Dielect. Electr. Insul.

Author:

Zhu Xuanyu¹^ORCID,Zhang Kaixin¹,Sun Jie¹^ORCID,Lin Chang¹,Pan Kui¹,Yang Tianxi¹,Huang Zhonghang¹,Deng Liying¹,Yan Ziwen¹,Liu Yifeng¹,Nie Junyang¹,Yan Qun¹

Affiliation:

1. National and Local United Engineering Laboratory of Flat Panel Display Technology, College of Physics and Information Engineering, and the Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou University, Fuzhou, China

Funder

National Key Research and Development Program of China

Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China

Fujian Provincial Projects

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Link

http://xplorestaging.ieee.org/ielx7/94/10623348/10415209.pdf?arnumber=10415209

Reference35 articles.

1. Semiconductor and electrochromic properties of electrochemically deposited nickel oxide films

2. Oxidized In-containing III-V(100) surfaces: Formation of crystalline oxide films and semiconductor-oxide interfaces

3. Preparation of monolayer hollow spherical tungsten oxide films with enhanced near infrared electrochromic performances

4. Self-supporting graphene oxide films preparation and characterization methods

5. Preparation of transparent and hydrophobic cerium oxide films with stable mechanical properties by magnetron sputtering

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