Author:
Ajuria S.A.,Maiti B.,Tobin P.J.,Mele T.C.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Oxidation and Gate Dielectrics;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09
2. Nitrogen Implantation and In Situ HF Vapor Clean for Deep Submicrometer n-MOSFETs;Journal of The Electrochemical Society;2002