A four-point electrical measurement technique for characterizing mask superposition errors on semiconductor wafers-Reference-Cited by-同舟云学术

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A four-point electrical measurement technique for characterizing mask superposition errors on semiconductor wafers

Published:1978-08 Issue:4 Volume:13 Page:436-444
ISSN:0018-9200
Container-title:IEEE Journal of Solid-State Circuits
language:
Short-container-title:IEEE J. Solid-State Circuits

Author:

Perloff D.S.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering

Link

http://xplorestaging.ieee.org/ielx5/4/22561/01051074.pdf?arnumber=1051074

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