Sputter deposition of stress-controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications
Author:
Affiliation:
1. Fraunhofer Institute for Electron Beam and Plasma Technology (FEP), Dresden, Germany
2. Fraunhofer Institute for Ceramic Technologies and Systems / Materials Diagnostics (IKTSMD), Dresden, Germany
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Acoustics and Ultrasonics,Instrumentation
Link
http://xplorestaging.ieee.org/ielx7/58/6863839/06863854.pdf?arnumber=6863854
Cited by 32 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A review of oriented wurtzite-structure aluminum nitride films;Journal of Alloys and Compounds;2024-06
2. ScxAl1-xN piezoelectric film grown at room temperature;Journal of Physics: Conference Series;2024-04-01
3. High-quality c-axis oriented Al(Sc)N thin films prepared by magnetron sputtering;Thin Solid Films;2023-09
4. Material strategies to enhance the performance of piezoelectric energy harvesters based on lead-free materials;Journal of Micromechanics and Microengineering;2023-03-30
5. Crystal structure deformation and phase transition of AlScN thin films in whole Sc concentration range;Journal of Applied Physics;2022-07-14
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