Development of stable high-resistance standard resistors-Reference-Cited by-同舟云学术

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Development of stable high-resistance standard resistors

Published:2024-07-08 Issue: Volume: Page:1-2
ISSN:
Container-title:2024 Conference on Precision Electromagnetic Measurements (CPEM)
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Author:

Oe Takehiko¹,Okazaki Yuma¹,Tanaka Takahiro¹,Kaneko Nobu-Hisa²,Yoshida Masato³,Tsuri Kazuhiro³,Kukisawa Takashi³

Affiliation:

1. National Institute of Advanced Industrial Science and Technology (AIST),National Metrology Institute of Japan (NMIJ),Tsukuba, Ibaraki,Japan,305-8563

2. Global Research and Development Center for Business by Quantum-AI Technology (G-QuAT),Tsukuba, Ibaraki,Japan,305-8560

3. Japan Finechem Company, Inc.,Hiratsuka, Kanagawa,Japan,254-0016

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx8/10645824/10645825/10646136.pdf?arnumber=10646136

Reference8 articles.

1. Final report on supplementary comparison EURAMET.EM-S32: Comparison of resistance standards at 1 TΩ and 100 TΩ

2. 10 TΩ and 100 TΩ Resistance Comparison Between NIST and AIST

3. Precise high resistance comparison between the NMIJ traveling dual source bridge and the NIST adapted Wheatstone bridge

4. Fabrication of high-value standard resistors

5. Next generation guarded Hamon transfer standards for high resistance

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