Monolithic Integration of GaN-Based Enhancement/Depletion-Mode MIS-HEMTs With AlN/SiN Bilayer Dielectric
Author:
Affiliation:
1. Institute of Microelectronics, Peking University, Beijing, China
2. Hebei Semiconductor Research Institute, Shijiazhuang, Hebei, China
Funder
National Key Research and Development Program of China
Ningbo Key Scientific and Technological Project
Research Staff of Atomic Nano-Materials and Equipment Company Ltd.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/55/9811240/09787501.pdf?arnumber=9787501
Reference27 articles.
1. Monolithically integrated 600-V E/D-mode SiNx/AlGaN/GaN MIS-HEMTs and their applications in low-standby-power start-up circuit for switched-mode power supplies;tang;Proc IEEE Int Electron Devices Meeting,2013
2. Integration of enhancement and depletion-mode AlGaN/GaN MIS-HFETs by fluoride-based plasma treatment
3. E/D-Mode GaN Inverter on a 150-mm Si Wafer Based on p-GaN Gate E-Mode HEMT Technology
4. High-Speed 501-Stage DCFL GaN Ring Oscillator Circuits
5. Technology and Reliability of Normally-Off GaN HEMTs with p-Type Gate
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