Plasma Modeling Framework on Dielectric Surfaces in Hybrid Bonding Technology
Author:
Affiliation:
1. Applied Materials,United States of America
2. Applied Materials,Singapore
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10457288/10457581/10457604.pdf?arnumber=10457604
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1. Three-Dimensional Integrated Circuits and the Future of System-on-Chip Designs
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3. Heterogeneous Integration for Performance and Scaling
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5. Heterogeneous Integration Challenges Within Wafer Level Fan-Out SiP for Wearables and IoT
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1. D2W Hybrid Bonding Challenges for HBM;2024 IEEE International Memory Workshop (IMW);2024-05-12
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