Process Variation's Effect on Various Threshold Voltage Assignments in 6T SRAM Designs Using 12nm FinFET Technology

Author:

Irin Umme Rani1,Barua Sajib1,Azmir Md Minhajul1,Hassan Tasnuva1,Mohammed Dewan1

Affiliation:

1. Ulkasemi Private Limited,Circuit and System Design Department,Dhaka,Bangladesh

Publisher

IEEE

Reference7 articles.

1. SRAM devices and circuits optimization toward energy efficiency in multi-Vth CMOS

2. Ultra-Low Power, Process-Tolerant 10T (PT10T) SRAM with Improved Read/Write Ability for Internet of Things (IoT) Applications

3. Subthreshold SRAM: Challenges, design decisions, and solutions

4. Maximization of SRAM energy efficiency utilizing MTCMOS technology

5. Numerical Estimation of Yield in Sub-100-nm SRAM Design Using Monte Carlo Simulation;nho;Numerical Estimation of Yield in Sub-100-nm SRAM Design Using Monte Carlo Simulation IEEE Transactions on Circuits and Systems II Express Briefs,2008

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Power Optimization in 6T-SRAM Cell using Carbon Nanotube Field-Effect Transistors (CNTFET);2023 7th International Conference on Electronics, Communication and Aerospace Technology (ICECA);2023-11-22

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