Influence of Penning Ionization and Attachment Reaction Rates on Dielectric Barrier Discharge
Author:
Affiliation:
1. Electric Power Research Institute Guangdong Power Grid Co. Ltd,Guangdong Key Laboratory of Electric Power Equipment Reliability,Guangzhou,China
Funder
China Southern Power Grid
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9707902/9707908/09708086.pdf?arnumber=9708086
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1. Numerical investigation of Ar–NH3mixture in homogenous DBDs
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3. Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge
4. Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge;chang;J Appl Phys 2014,0
5. Systematic investigation of the barrier discharge operation in helium, nitrogen, and mixtures: discharge development, formation and decay of surface charges
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